铁磁膜的居里温度

应用科学学报 ›› 1996, Vol. 14 ›› Issue (2): 219-222.

铁磁膜的居里温度

吴雪原¹, 顾世洧¹, 李惠生²

1. 上海交通大学;
2. 香港理工学院

收稿日期:1994-05-18 修回日期:1994-10-22 出版日期:1996-06-30 发布日期:1996-06-30
作者简介:吴雪原:硕士,上海交通大学应用物理系,上海 200030
基金资助:
国家自然科学基金资助项目(59371013)

THE CURIE TEMPERATURE OF FERROMAGNETIC FILMS

WU XUEYUAN¹, GU SHIWEI¹, LI WEISHENG²

1. Shanghai Jiao Tong University;
2. Hong Kong Polytechnic

Received:1994-05-18 Revised:1994-10-22 Online:1996-06-30 Published:1996-06-30

摘要/Abstract

摘要： 在考虑了边界条件对电子态和电子组态的影响乃至对自旋之间交换作用影响的基础上,计算了4~7单分子层厚的铁磁膜的居里温度随膜厚的变化关系.结果表明居里温度随膜变薄而降低,这从微观上肯定了一般的理论预测并解释了近期的实验结果.

关键词: 居里温度, 超薄铁磁膜, 维度过度

Abstract: The thickness dependence of the Curie temperature for the ultra-thin ferromagnetic films ranging in thickness from 4 to 7 monolayers has been calculated by considering the effects of the bound condition on the state and configuration of the electron and consequently on the exchange couplings between spins. The results show that the Curie temperature decreases with the reduction of the film's thickness. This confirms the general theoretical expectation from the microscopic point of view and explains the recent experimental results.

Key words: Curie temperature, ultrathin ferromagnetic film, dimensional crossover

吴雪原, 顾世洧, 李惠生. 铁磁膜的居里温度[J]. 应用科学学报, 1996, 14(2): 219-222.

WU XUEYUAN, GU SHIWEI, LI WEISHENG. THE CURIE TEMPERATURE OF FERROMAGNETIC FILMS[J]. Journal of Applied Sciences, 1996, 14(2): 219-222.