English

应用科学学报 ›› 1989, Vol. 7 ›› Issue (2): 129-136.

• 论文 • 上一篇    下一篇

适用于VLSI的光刻模型及模拟的若干研究

冯向明, 阮刚   

  1. 复旦大学
  • 收稿日期:1987-08-12 修回日期:1988-01-05 出版日期:1989-06-30 发布日期:1989-06-30
  • 基金资助:
    国家自然科学基金资助课题

SOME STUDIES ON THE MODELING AND SIMULATION OF OPTICAL LITHOGRAPHY FOR VLSI

FENG XIANGMING, RUAN GANG   

  1. Fudan University
  • Received:1987-08-12 Revised:1988-01-05 Online:1989-06-30 Published:1989-06-30

PDF

116

摘要： 本文讨论了光刻模拟的有关模型,提出了一种适用于VLSI光刻工艺模拟的程序FUPLIS,给出了用FUPLIS对若干光刻工艺进行模拟的结果,模拟结果对光刻工艺的理解和指导有重要作用.

Abstract: In this article, some physical models related to the optical lithography simulation are discussed. A program, FUPLIS, which is used to simulate the VLSI lithography process has been developed. Some simulated results given by FUPLIS are presented. And it is shown that the simulated results play an important role in the understanding and guidance of the lithography process.