Journal of Applied Sciences ›› 1996, Vol. 14 ›› Issue (4): 488-492.
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YE YUTANG, YE LINA, WANG RUIFENG, CHEN GUANHUA, SHEN XIAO, HONG YONGHE
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Abstract: A novel method of RF sputtering is discribed. The usefulness for the fabrication of the 10.6μm Ge-Ag-Ni hollow waveguide with a small diameter of the method is discussed. Some samples have been fabricated using the method and the transmittance of the samples with different waveguide diameters is presented.
Key words: 10.6μm waveguide, Ge-Ag-Ni waveguide, RF sputtering
YE YUTANG, YE LINA, WANG RUIFENG, CHEN GUANHUA, SHEN XIAO, HONG YONGHE. A NOVEL METHOD OF RF SPUTTERING FOR FABRICATION OF 10.6μm Ge-Ag-Ni HOLLOW WAVEGUIDE[J]. Journal of Applied Sciences, 1996, 14(4): 488-492.
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https://www.jas.shu.edu.cn/EN/Y1996/V14/I4/488
