磁控溅射薄膜的厚度分布

Journal of Applied Sciences ›› 1993, Vol. 11 ›› Issue (2): 136-140.

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THICKNESS DISTRIBUTION OF THIN FILM DEPOSITED WITH MAGNETRO-SPUTTERING

FAN ZHENGXIU, XUE SONGSHENG, HE ZHAOLING

Shanghai Institute of Optics and Fine Mechanics

Received:1991-06-01 Revised:1992-01-02 Online:1993-06-30 Published:1993-06-30

Abstract

Abstract: Thickness distribution of thin films deposited with magnetro-sputtering is studied in this paper. Theoretical analysis tand value calculation are conducted under three conditions when the substrate is fixed; when the substrate is rotating; and both the substrate and the workshelf are rotating. It is shown that the distribution mainly depends on the highness of the substrate. Very uniform thin film is deposited on the substrate by adjusting the highness of the substrate and and distance between the target and the rotating center, as proved by experiments.

Key words: thin film, thickness, magnetro-sputtering

FAN ZHENGXIU, XUE SONGSHENG, HE ZHAOLING. THICKNESS DISTRIBUTION OF THIN FILM DEPOSITED WITH MAGNETRO-SPUTTERING[J]. Journal of Applied Sciences, 1993, 11(2): 136-140.

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THICKNESS DISTRIBUTION OF THIN FILM DEPOSITED WITH MAGNETRO-SPUTTERING

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