硫脲加速和稳定化学沉积镍的机理

Journal of Applied Sciences ›› 1997, Vol. 15 ›› Issue (2): 229-233.

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ACCELERATION AND STABLIZATION MECHANISM OF ELECTROLESS NICKEL DEPOSITION BY THIOUREA

HAN KEPING, FANG JINGLI

Nanjing University, Nanjing 210093

Received:1995-10-25 Revised:1996-01-21 Online:1997-06-30 Published:1997-06-30

Abstract

Abstract: Influences of thiourea on electroless nickel deposition rate, hydrogen evolution, polarization curves and stationary potential wore determined. Together with the X-ray photoelectron spectroscopy (XPS) analysis of the deposit. the mechanism for acceleration and stabilization of electroless nickel deposition by thio-urea has been discussed.

Key words: thiourea, eleotroless nickel deposition, acceleration, stabilization, mechanism

HAN KEPING, FANG JINGLI. ACCELERATION AND STABLIZATION MECHANISM OF ELECTROLESS NICKEL DEPOSITION BY THIOUREA[J]. Journal of Applied Sciences, 1997, 15(2): 229-233.

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ACCELERATION AND STABLIZATION MECHANISM OF ELECTROLESS NICKEL DEPOSITION BY THIOUREA

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