Journal of Applied Sciences ›› 1994, Vol. 12 ›› Issue (1): 88-91.
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WANG GUOQUAN, LOU TENGJIAO, WANG QINMEI, WU YULI
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Abstract: This paper describes briefly the principle and characteristics of electron-beam lithography.The mechanism of the interaction of energetic electrons with resist materials is also described.The whole processing of XH-REP-2 positive electronbcam resists discussed in detail. We have found a group of optimal parameters of XH-REP-2 positive electron-beam resists and come to the conclusion that XH-REP-2 positive electron-beam resists have high resolution and sensitivity.
Key words: descum, electron-beam lithography
WANG GUOQUAN, LOU TENGJIAO, WANG QINMEI, WU YULI. STUDY OF OPTIMAL PROCESSING FORXH-REP-2 POSITIVE ELECTRON-BEA MRESISTS[J]. Journal of Applied Sciences, 1994, 12(1): 88-91.
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https://www.jas.shu.edu.cn/EN/Y1994/V12/I1/88
