Journal of Applied Sciences ›› 1995, Vol. 13 ›› Issue (3): 347-351.

• Articles • Previous Articles     Next Articles

STUDY OF MULTILAYER STRUCTURE USING X-RAY DOUBLE CRYSTAL DIFFRACTION

WU YUNZHONG1, XU XUEMING1, WANG WEIYUAN1, TENG QIN2   

  1. 1. Shanghai Institute of Metallurgy, Academia Science;
    2. Shanghai Institute of Oeramics, Acodsmia Science
  • Received:1993-08-06 Revised:1993-11-28 Online:1995-09-30 Published:1995-09-30

Abstract: The multilayer strncture composed of a glass film, a platinumfilm and an α-Al2O3 substrate has been studied by using the technique ofX-ray double crystal diffraction and it is found that different glass materials result in different stresses in the Pt film caused by thermal mismatch within the multilayer materials. The measuring results of the thin film platinum resistor show that the stresses will induce resistance change of the device and different stress status will produce added resistance in different directions. Selecting proper glass materials can make opposite stress in Pt film and opposite anded resistance due to thermal mismatch. The reliability of Pt resistor has been raised with the method of this stress compensation.

Key words: X-ray double crystal diffraction, added resistance, Thermal stress, thermal mismatch