Journal of Applied Sciences ›› 1988, Vol. 6 ›› Issue (3): 255-259.

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EQUILIBRIUM CALCULATIONS ON THE HYDROGEN PARTITION OF SOCl2 AND CF4 IN MCVD SILICA SYSTEM

YAN YIMIN, KUO CHUKUN, ZHANG YINGHUA   

  1. Shanghai Institute of Ceramics, Chinese Academy of Sciences
  • Received:1985-01-21 Revised:1985-05-25 Online:1988-09-30 Published:1988-09-30

Abstract: The equilibria of the systems O2-H2O-CH4-SOCl2-SiO2 and O2-H2O-CH4-CF4-SiO2 for compositions of interest to the MCVD silica fibre process have been calculated. The equilibrating hydroxyl concentration in the resulting SiO2 glass at 1073-2573K is given and the ability of SOCl2 and CF4 to remove hydrogen from the chemical deposition system is discussed.