MOCVD装置的微机控制

应用科学学报 ›› 1989, Vol. 7 ›› Issue (2): 148-152.

MOCVD装置的微机控制

翟其刚, 徐林木, 陈伟民, 俞光仪

中国科学院上海冶金研究所

收稿日期:1987-02-24 修回日期:1987-10-04 出版日期:1989-06-30 发布日期:1989-06-30

A CONTROL SYSTEM BASED AN MICROCOMPUTER FOR MOCVD

ZHAI QIGANG, XU LINMUU, CHEN WEIMIN, YU GUANGYI

Shanghai Institute of Metallurgy

Received:1987-02-24 Revised:1987-10-04 Online:1989-06-30 Published:1989-06-30

摘要/Abstract

摘要： 本文叙述了一个MOCVD装置的微计算机控制系统.控制系统包括微计算机接口、每一种气体质量流量控制、各种有机源的温度控制、射频加热感应器的温度控制、多通道气体开关和屏幕指示等.

Abstract: This paper describes a control system for MOCVD by the use of a microcomputer. The MOCVD is a metal-organic chemical vapor deposition (MOCVD) system specifically designed for developing epitaxial layers of gallium-arsenide and other Ⅲ-Ⅴ/Ⅱ-Ⅵ semiconductor compound materials. It is also useful for the investigation of super-lattice.
The control system consists of a microcomputer interface, a mass flow control for each gas, a temperature control for the baths for each metal-organic source, a temperature control for RF-heated susceptor, a gas switching manifold, a gas panel and so on.
The accuracy of the temperature control for the RF-heated susceptor is 0.05%, The error of the temperature control for metal-organic baths is about-15±0.01℃.
The fully automated process control is achieved in a safe, accurate manner by the use of the control system based on a microcomputer under any adverse circumstance.

翟其刚, 徐林木, 陈伟民, 俞光仪. MOCVD装置的微机控制[J]. 应用科学学报, 1989, 7(2): 148-152.

ZHAI QIGANG, XU LINMUU, CHEN WEIMIN, YU GUANGYI. A CONTROL SYSTEM BASED AN MICROCOMPUTER FOR MOCVD[J]. Journal of Applied Sciences, 1989, 7(2): 148-152.