应用科学学报 ›› 1990, Vol. 8 ›› Issue (2): 117-125.

• 论文 • 上一篇    下一篇

LDD MOSFET表面横向电场模型及其应用

陈晓, 阮刚, 章倩苓   

  1. 复旦大学
  • 收稿日期:1988-11-08 出版日期:1990-06-30 发布日期:1990-06-30
  • 基金资助:
    国家自然科学基金资助课题

SURFACE LATERAL ELECTRIC FIELD FOR LDD MOSFET AND ITS APPLICATION

CHEN XIAO, EUAN GANG, ZHANG QIANLING   

  1. Fudan University
  • Received:1988-11-08 Online:1990-06-30 Published:1990-06-30

摘要: 本文提出了一种计算LDD (Light-Doped Drain) MOSFET表面横向电场的解析模型.该模型含LDD MOSFET几何和掺杂参数,可用以计算具有不同长度、结深及掺杂的轻掺杂漏区的LDD MOSFET表面横向电场,并可计算常规MOSFET和缓交漏MOSFET的表面横向电场.用该模型算得结果与用FD-MINIMOS进行数值计算得到的结果相符.基于该模型算得的电场结果,可计算衬底电流,并进而计算击穿电压.该模型可十分简便地确定LDDMOSFET的最佳几何参数的掺杂参数,为LDD MOSFET的设计提供便利的工具和快速的参数提取方法.

Abstract: In this paper, an analytical model of the surface lateral electric field for LDD MOSFET is presented. This model contains geometric and doping parameters of LDD MOSFET. It can be used to calculate the surface lateral electric field of LDD MOSFET which has lightly doped drain regions of different lengths, junction depths and doping concentrations, Using this model, the electric field of the conventional and graded drain MOSFET can also be calculated. The result obtained from this model is identical with the numerical result of FD-MINIMOS. This model can also be applied to calculate the substrate current and breakdown voltage. According to this model, the optimal geometric and doping parameters can be easily determined. The present model provides a fast method for extracting the related parameters and is a convenient tool for the LDD MOSFET design.