English

应用科学学报 ›› 1994, Vol. 12 ›› Issue (3): 227-232.

• 论文 • 上一篇    下一篇

非晶超晶格多层膜的形成及其光学特性的研究

吴鼎祥, 徐克西   

  1. 上海科学技术大学
  • 收稿日期:1992-03-27 修回日期:1993-04-01 出版日期:1994-09-30 发布日期:1994-09-30

RESEARCH ON FORMING THE FILM OF AMORPHOUS SUPERLATTICE MULTILAYER STRUCTUREAND ITS PHOTOPROPERTIES

WU DINGXIANG, XU KEXI   

  1. Shanghai University of Science and Technology
  • Received:1992-03-27 Revised:1993-04-01 Online:1994-09-30 Published:1994-09-30

PDF

57

被引次数

1

摘要： 介绍利用波长为193nm的ArF准分子激光的光化学反应,分解Si2H6和C2H2原料气体制备a-Si:H/a-Sic:H非晶超晶格多层膜以及讨论这种膜的量子尺寸效应,紫外吸收等光学特性.

关键词: 超晶格, 光化学反应, 量子尺寸效应

Abstract: In this article the photochemical reaction is introduced by using ArF excimer laser of wave length 193nm to decompose the feed gases Si2H6 and C2H2 for fabricating the a-Si:H/a-SiC:H film of the amorphous superlattice multilayer structure. The photoproperties of the quantum size effect,the ultraviolet absorption,etc of such a film are discussed.

Key words: Photochemical reaction, Superlattice, Quantum size effects