应用科学学报 ›› 1995, Vol. 13 ›› Issue (1): 35-38.

• 论文 • 上一篇    下一篇

MPCVD法沉积金刚石薄膜中等离子体光谱

周明华, 夏义本, 张虚白, 王鸿   

  1. 上海大学嘉定校区
  • 收稿日期:1992-12-28 修回日期:1993-06-18 出版日期:1995-03-31 发布日期:1995-03-31

AN INVESTIGATION OF PLASMA SPECTRUM IN THE PROCESS OF DIAMOND THIN FILM DEPOSITED BY MPCVD

ZHOU MINGHUA, XI YIBEN, ZHANG XUBAI, WANG HONG   

  1. Shanghai University Jiading Campus
  • Received:1992-12-28 Revised:1993-06-18 Online:1995-03-31 Published:1995-03-31

摘要: 从等离子体发射光谱变化这一角度研究在不同沉积条件下等离子体中电子平均能量的特点,分析碳源气体分子与电子的碰撞以及碳氢基团的能态变化,从而对等离子体法沉积金刚石薄膜微观机理进行初步的探索。

关键词: 电子平均动能, 金刚石薄膜, 等离子体光谱

Abstract: The character of the average energy of the electrons in the plasma ball generated by microwaves is studied by observing the spectrum of the plasma ball under different depositing conditions.The mechanism of deposition is discussed by analyzing the collisions between electrons and hydrocarbon molecules and the change of the hydrocarbon radicals' energy.

Key words: average energy of electrons, diamond film plasma spectrum