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应用科学学报 ›› 1996, Vol. 14 ›› Issue (4): 379-384.

• 论文 •    下一篇

退火对杂化膜驻极体PVDF/SiO2电荷贮存的影响

柏维, 杨大本   

  1. 电子科技大学
  • 收稿日期:1994-10-14 修回日期:1995-12-10 出版日期:1996-12-31 发布日期:1996-12-31
  • 作者简介:柏维:讲师,电子科技大学材料科学与工程系,成都 610054
  • 基金资助:
    国家自然科学基金资助项目

THE INFLUENCE OF ANNEALING PROCESS ON THE CHARGE STORAGE IN HyBRID FILM ELECTRET PVDF/SiO2

BAI WEI, YANG DABEN   

  1. University of Electronic Sicence and Technology of of China
  • Received:1994-10-14 Revised:1995-12-10 Online:1996-12-31 Published:1996-12-31

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摘要： 该文通过表面电位衰减实验和TSD电流谱,研究了退火热处理工艺对杂化膜驻极体PVDF/SiO2(PVDF-聚偏氟乙烯)电荷贮存及稳定性的影响.用红外光谱实验对样品退火前、后驻极体性能改变的起因进行了初步探索,得出注极前样品的高温退火处理,可明显改善杂化膜驻极体PVDF/SiO2的电荷贮存及稳定性.

关键词: 驻极体, 电荷贮存, 退火, 表面电位, 电荷稳定性

Abstract: In this paper,the influence of annealing process on the charge storage and stability in hybrid film electret PVDF/SiO2 was studied by means of surface potential decay and TSD-spectra. The properties of the film, before and after annealing, were discussed by means of infrared spectrum analysis. The experimental results show that electret properties of the sample were improved after annealing.

Key words: charge storage, annealing, charge stability, electret surface potential