English

应用科学学报 ›› 1996, Vol. 14 ›› Issue (4): 481-487.

• 论文 • 上一篇    下一篇

原子力显微镜研究多晶硅和铝硅合金表面形貌

吴敬文1, 陆祖宏1, 韦钰1, 朱伟民2   

  1. 1. 东南大学;
    2. 无锡华晶集团
  • 收稿日期:1995-01-25 修回日期:1995-06-01 出版日期:1996-12-31 发布日期:1996-12-31
  • 作者简介:吴敬文:博士,东南大学生物医学系,南京 210096

STUDY ON SURFACE MORPHOLOGIES OF POLYCRYS TALLINE SILICON AND ALUMINIUM SILICON ALLOY BY ATOMIC FORCE MICROSCOPY

WU JINGWEN1, LU ZHUHONG1, WEI YU1, ZHU WEIMING2   

  1. 1. Southeast University;
    2. Wuxi Huajing Electronic Corporation
  • Received:1995-01-25 Revised:1995-06-01 Online:1996-12-31 Published:1996-12-31

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摘要： 利用原子力显微镜研究了不同淀积温度条件下低压化学气相淀积(LPCVD)多晶硅薄膜的表面形貌.发现淀积时间一定时,随着淀积温度的升高,多晶硅薄膜的晶粒尺寸和表面粗糙度均非线性地增大.另外,还研究了不同基片温度条件下磁控溅射铝硅含金薄膜的表面形貌.

关键词: 多晶硅, 表面形貌, 原子力显微镜, 铝硅合金

Abstract: In this Paper, we studied the surface morphology of Low Pressure Chemical Vapor Deposition (LPCVD) polycrstalline silicon at different deposition temperatures by Atomic Force Microscopy (AFM).We found when the deposition time was the same, the grain size and microroughness increased with the increse of the deposition temperature. In addition, we also studied the morphology of magnetron sputtered aluminium silicon alloy at different sputter temperatures by AFM. We found the irregular-shaped grains tilting in varying degrees and piled up in space at 0℃ and the irregular-shaped grains joining together on a plane at 200℃. Furthermore when the sputter temperature was 400℃, the grain size turned to be square-shaped.

Key words: polycrystalline silicon, aluminium silicon alloy, atomic force microscopy, surface morphology