10,6μmGe-Ag-Ni空心波导射频溅射镀膜的一种新方法

应用科学学报 ›› 1996, Vol. 14 ›› Issue (4): 488-492.

10,6μmGe-Ag-Ni空心波导射频溅射镀膜的一种新方法

叶玉堂, 叶莉娜, 王瑞峰, 陈冠华, 沈晓, 洪永和

电子科技大学

收稿日期:1994-10-05 出版日期:1996-12-31 发布日期:1996-12-31
作者简介:叶玉堂:副教授,电子科技大学光电子技术系,成都 610054
基金资助:
国防科工委和电科院资助项目

A NOVEL METHOD OF RF SPUTTERING FOR FABRICATION OF 10.6μm Ge-Ag-Ni HOLLOW WAVEGUIDE

YE YUTANG, YE LINA, WANG RUIFENG, CHEN GUANHUA, SHEN XIAO, HONG YONGHE

University of Electronic Science and Technology of China

Received:1994-10-05 Online:1996-12-31 Published:1996-12-31

摘要/Abstract

摘要： 该文提出一种射频溅射镀膜的新方法,讨论了该方法对小孔径10.6μmGe-Ag-Ni空心波导制作的意义,利用该方法已制成样品,同时给出并比较了几个不同孔径样品的光透射率.

关键词: Ge-Ag-Ni空心波导, 10.6μm波导, 射频溅射

Abstract: A novel method of RF sputtering is discribed. The usefulness for the fabrication of the 10.6μm Ge-Ag-Ni hollow waveguide with a small diameter of the method is discussed. Some samples have been fabricated using the method and the transmittance of the samples with different waveguide diameters is presented.

Key words: 10.6μm waveguide, Ge-Ag-Ni waveguide, RF sputtering

叶玉堂, 叶莉娜, 王瑞峰, 陈冠华, 沈晓, 洪永和. 10,6μmGe-Ag-Ni空心波导射频溅射镀膜的一种新方法[J]. 应用科学学报, 1996, 14(4): 488-492.

YE YUTANG, YE LINA, WANG RUIFENG, CHEN GUANHUA, SHEN XIAO, HONG YONGHE. A NOVEL METHOD OF RF SPUTTERING FOR FABRICATION OF 10.6μm Ge-Ag-Ni HOLLOW WAVEGUIDE[J]. Journal of Applied Sciences, 1996, 14(4): 488-492.