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应用科学学报 ›› 1991, Vol. 9 ›› Issue (1): 43-48.

• 论文 • 上一篇    下一篇

氟离子辐照对聚四氟乙烯基底上金属薄膜附着力的影响

刘正民, 杨莹   

  1. 兰州大学
  • 收稿日期:1989-07-11 修回日期:1990-01-12 出版日期:1991-03-31 发布日期:1991-03-31

ADHESION IMPROVEMENT INDUCED BY6MeV F IONS FOR THIN METAL FILMS ON TEFLON SUBSTRATES

LIU ZHENGMIN, YANG YING   

  1. Lanzhou University
  • Received:1989-07-11 Revised:1990-01-12 Online:1991-03-31 Published:1991-03-31

PDF

102

被引次数

1

摘要： 用6 MeV的氟离子对淀积在聚四氟乙烯基底上的In、Sn、Al、Cu、Pd和Ni等金属薄膜进行了一定剂量范围的辐照,测定了发生增强附着效应的阈剂量值.结果表明,阈剂量的大小和膜材料的弹性模量及电子阻止本领有关.据此提出了一个增强附着效应起因于膜内应力变化的假设.应用这一假设解释了一些与增强附着效应相关的现象.

关键词: 阈剂量, 增强附着, 薄膜, 应力

Abstract: The enhanced adhesion of In, Sn, Al, Pd, Cu and Ni films on Teflon substrates under 6 MeV F ion irradiation was studied. The adhesion threshold doses for the films were measured using the Scotch tape test and found to be proportional to the ratio of the film material modulus of elasticity to the electronic stopping power. A possible mechanism of enhanced adhesion is presented based on our experiments. Thus some phenomena in the ion beam enhanced adhesion area, which have not been understood before, are explained, using this mechanism.

Key words: threshold dose, enhanced adhesion, film, stress