激光CVD制备a-Si:H/a-SiC:H多层非晶薄膜的方法及其光学特性研究

应用科学学报 ›› 1993, Vol. 11 ›› Issue (2): 166-170.

激光CVD制备a-Si:H/a-SiC:H多层非晶薄膜的方法及其光学特性研究

吴鼎祥

上海科学技术大学

收稿日期:1991-05-29 修回日期:1991-12-14 出版日期:1993-06-30 发布日期:1993-06-30

A METHOD TO FORM a-Si:H/a-SiC:H MULTILAYER AMORPHOUS FILM WITH LASER CVD AND THE RESEARCH OF ITS OPTICAL CHAR ACTERISTICS

WU DINGXIANG

Shanghai University of Science and Technology

Received:1991-05-29 Revised:1991-12-14 Online:1993-06-30 Published:1993-06-30

摘要/Abstract

摘要： 介绍利用激光的光化学反应来分解气体制备α-Si:H/α-SiC:H多层非晶薄膜的方法,并对应用XPS等手段测得的这种非晶薄膜的光学特性进行了讨论.

关键词: 光化学反应, X线光电子分光法, 激光CVD, 多层非晶膜

Abstract: This paper introduces a method of analysing gas by photochemical reaction of laser to form an α-SiH/α-SiC:H multilayer structure amorphous film, and discusses its optical characteristics measured with XPS and other means.

Key words: X-ray photoelectron spectroacopy, photochemical reaction, laser chemical vapor deposition, multilayer amorphous film

吴鼎祥. 激光CVD制备a-Si:H/a-SiC:H多层非晶薄膜的方法及其光学特性研究[J]. 应用科学学报, 1993, 11(2): 166-170.

WU DINGXIANG. A METHOD TO FORM a-Si:H/a-SiC:H MULTILAYER AMORPHOUS FILM WITH LASER CVD AND THE RESEARCH OF ITS OPTICAL CHAR ACTERISTICS[J]. Journal of Applied Sciences, 1993, 11(2): 166-170.