English
CoSi2/Si结构中杂质离子注入及自对准硅化物MOS器件技术
刘平, 李炳宗, 黄维宁, 姜国宝, 顾志光
ION IMPLANTATlON THROUGH CoSi2/Si AND SELF-ALIGNED SILICIDED MOS DEVICE TECHNOLOGY
LIU PING, LI BINGZONG, HUANG WEINING, JIANG GUOBAO, GU ZHIGUANG
应用科学学报 . 1994, (4): 401 -408 .