Journal of Applied Sciences ›› 1985, Vol. 3 ›› Issue (2): 184-185.

• Articles • Previous Articles     Next Articles

78 K INFRARED ABSORPTION METHOD FOR MEASURING THE OXYGEN CONTENT IN SILICON

LI YUEZHEN, SHEN JINYUAN, REN NING, WANG QIMIN   

  1. Shanghai Institute of Metallurgy, Academia Sinica
  • Received:1982-09-01 Revised:1984-04-25 Online:1985-06-30 Published:1985-06-30

Abstract: A more accurate calibration curve at 78K for measuring the oxygen content in silicon single crystals has been established by the infrared absorption difference method. The resulting formula is N0=2.6α ppmA, or N0=1.3×1017α atoms/cm3 where α represents the IR absorption coefficient.