Abstract: The paper introduces the difference between using plasma chemistry reaction and non-plasma chemistry reaction to draw metal ions from the E. F. ion source. Plasma chemistry reaction is applied to the E. F. ion source and the implanter successfully. The effect, having its own characteristics, is very satisfying. By means of plasma chemistry reaction combined with physics, metal ion beams, especially the beams of high volatility temperature, are obtained easily. These ions are:Re⁺, W⁺, Mo⁺, Y⁺, Nd⁺, Pd⁺, Au⁺, Ta⁺, Ti⁺, Cr⁺, Ce⁺, Ag⁺, Fe⁺, Cu⁺, V⁺, Al⁺, Be⁺, Li⁺, Si⁺, Ga⁺, In⁺, Bi⁺ and so on.