Abstract: The pure tantalum boat used as a source heater for vacuum evaporation of pure Al, Cr, Si, Ti, Al-Si and TiSi₂ films is developed. This resistor heater method is attractive because it is simple and inexpensive, there is no ionization radiation and no mobile ion contamination from the heater, and the composition and properties can be controlled. Now this method is incorporated in our LSI development.