Journal of Applied Sciences ›› 1989, Vol. 7 ›› Issue (1): 61-64.

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THE MEASUREMENT OF SPECIFIC CONTACTRESISTANCE OF M-S BY PROBE HEADSOF THE IN-LINE FOUR PROBES

CHEN CUNLI1, HUA WENYU2   

  1. 1. Nanjing University;
    2. East China Institute of Technology
  • Received:1987-05-17 Revised:1987-09-24 Online:1989-03-31 Published:1989-03-31

Abstract: In this paper, a simple method to measure the specific contact resistance of metal-semiconductor ohmic contact is developed, using the probe heads of the inline four probes. The equations to measure the specific contact resistance for a thin semiconductor layer have been derived. The experimental results are in good agreement with the in-line geometry transmission line model.