Journal of Applied Sciences ›› 1989, Vol. 7 ›› Issue (1): 61-64.
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CHEN CUNLI1, HUA WENYU2
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Abstract: In this paper, a simple method to measure the specific contact resistance of metal-semiconductor ohmic contact is developed, using the probe heads of the inline four probes. The equations to measure the specific contact resistance for a thin semiconductor layer have been derived. The experimental results are in good agreement with the in-line geometry transmission line model.
CHEN CUNLI, HUA WENYU. THE MEASUREMENT OF SPECIFIC CONTACTRESISTANCE OF M-S BY PROBE HEADSOF THE IN-LINE FOUR PROBES[J]. Journal of Applied Sciences, 1989, 7(1): 61-64.
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