Journal of Applied Sciences ›› 1990, Vol. 8 ›› Issue (3): 213-217.
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SUN XINGCHU
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Abstract: Presented here is an accurate extraction method of parasitic source/drain resistance and effective channel length for MOSFET. The determination of these parameters is important to device modeling and analysis, and the fabrication process control. A special group of test devices was designed and a computer program was used for the parameter extraction procedure. The drain current characteristics of the devices were calculated by using the extracted parameters and compared with the measured data. The results showed a good agreement.
SUN XINGCHU. AN EXTRACTION METHOD OF PARASITIC SOURCE/DRAIN RESISTANCE AND EFFECTIVE CHANNEL LENGTH[J]. Journal of Applied Sciences, 1990, 8(3): 213-217.
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https://www.jas.shu.edu.cn/EN/Y1990/V8/I3/213