Abstract: Titanium nitride films were prepared by simultaneous vacuum deposition of titanium and nitrogen ion beam bombardment with an ion energy of 40 KeV.RBS analysis showed that nitrogen ion bombardment could clearly reduce the oxygen concentration in the film. At the same atomio arrival ratio, the component ratio (N/Ti) in the films decreased with the increase of titanium deposition rate or sample temperature. This fact was considered to have arisen from the situation that the film composition was strongly affected by the adsorption of nitrogen. The films wore mainly TiN polyorystale. The preferred crystalline orientation of the film changed from <111> to <200> with the increase of the atomic arrival ratio (N/Ti). The titanium nitride films formed by dynamic ion beam mixing exhibited good and tear resistance and strong adhesion to the substrate.

Key words: TiN, ion beam mixing, film