[1] |
ZHANG Xiao-qing, XIA Zhong-fu, PAN Yong-gang, ZHANG Ye-wen, LI Bao-qing, LIN Zi-xin.
Influence of Boron Ion Implantation on the Electret Properties and Mechanic Properties of Si3N4 Film Based on Silicon Substrate
[J]. Journal of Applied Sciences, 2000, 18(3): 255-258.
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[2] |
GAO NAN, LU XUEFANG, LU CHENG.
Synthesis, Structure and Properties of Slicon Containing Quinone-Amine Polymers
[J]. Journal of Applied Sciences, 1998, 16(2): 243-248.
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[3] |
WANG MINGWANG, WEI TONGLI, LI YAO, XIAO ZHIXIONG.
SOFTWARE FOR SIMULATION OF SEMICONDUCTOR DEVICE FOR LOW TEMPERATURE:SE-PISCES
[J]. Journal of Applied Sciences, 1997, 15(3): 315-324.
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[4] |
WU JINGWEN, LU ZHUHONG, WEI YU, ZHU WEIMING.
STUDY ON SURFACE MORPHOLOGIES OF POLYCRYS TALLINE SILICON AND ALUMINIUM SILICON ALLOY BY ATOMIC FORCE MICROSCOPY
[J]. Journal of Applied Sciences, 1996, 14(4): 481-487.
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[5] |
Wu JIN, WEI TONGLI.
DELAYTIME ANALYSIS FOR SUPER HIGH SPEED BICMOS DIGITAL CIRCUITS IN LOW TEMPERATVRE
[J]. Journal of Applied Sciences, 1996, 14(4): 415-421.
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[6] |
WU JIN, WEI TONGLI.
AN ANLYTICAL CURRENT TRANSPORTATION MODEL FOR POLYSILICON EMITTER BIPOLAR TRANSISTOR OPERATION AT LOW TEMPERATURES
[J]. Journal of Applied Sciences, 1996, 14(3): 325-331.
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[7] |
ZHENG JIANG, XIAO ZHIXIONG, WU JIN, WEI TONGLI.
TRAPPING CHARACTERISTICS OF THE SHALLOW IMPURITY ENERGY LEVEL IN SILICON AT LOW TEMPERATURES
[J]. Journal of Applied Sciences, 1996, 14(1): 73-77.
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[8] |
MO YAOWU, AN QILIN, CHEN WET, LIU ZUGANG, JIANG XUEYIN, SHI WEIMEN, WU WENHAI.
INVESTIGATION OF PHOTOLUMINESCENT POROUS SILICON FORMED BY CHEMICAL ETCHING
[J]. Journal of Applied Sciences, 1995, 13(4): 405-412.
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[9] |
NI XIAOIWU, LU JIAN, HE ANZHI.
STUDY OF THE PLASMA PRODUCED BY YAG LASER ACTING UPON SILICON PHOTODIODE
[J]. Journal of Applied Sciences, 1995, 13(2): 159-162.
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[10] |
XIA ZHONGFU, LU METAN, P Guenther, SHI LINSHENG.
CHARGE DYNAMICS OF SILICON DIOXIDE ELECTRETS
[J]. Journal of Applied Sciences, 1995, 13(1): 21-28.
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[11] |
HUANG QINGAN, ZHANG HUIZHENG, CHEN JUNNING, TONG QINYI.
RAMAN SPECTRUM ANALYSIS OF STRESS DUE TO SILICON DIRECT BONDING
[J]. Journal of Applied Sciences, 1994, 12(3): 223-226.
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[12] |
LIN HUAMAO, XIA ZHONGFU, DING HAI, SHEN SHAOQUN.
THE INFLUENCE OF CHEMICAL SURFACE MODIFICATION ON CHARGE STORAGE STABILITY IN THE THERMALLY CROWN SiO2 FILM ELECTRET
[J]. Journal of Applied Sciences, 1994, 12(2): 101-108.
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[13] |
HUANG TONGKAI, GU JINMO, CH. SAJJAD AHMAD, JIN BIANJUN.
THE TEMPERATURE EFFECT OF NiCr-NiCu THERMOCOUPLE UNDER PRESSURE
[J]. Journal of Applied Sciences, 1992, 10(2): 137-140.
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[14] |
LIN HAIAN, ZHANG JIAWEI, CHEN JIAN.
A NEW MODEL FOR THE MECHANISM OF SILICON BIAS-DEPENDENT ETCHING AND HEAUILY DOPED ETCH-STOP
[J]. Journal of Applied Sciences, 1992, 10(2): 167-173.
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