氧化铝陶瓷/金刚石膜复合材料的表征及介电性质研究

Journal of Applied Sciences ›› 1998, Vol. 16 ›› Issue (3): 355-359.

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Investigation of the Dielectric Properties and Characterization of Diamond Film/Alumina Composites

MO YAOWU, XIA YIBEN, XIN JISHENG, HUANG XIAOQIN, WANG HONG

School of Materials Science & Engineering, Shanghai University, Shanghai 201800

Received:1996-09-19 Revised:1997-01-09 Online:1998-09-30 Published:1998-09-30

Abstract

Abstract: Diamond films were deposited on Al₂O₃ substrates by microwave plasma chemical vapor deposition (MPCVD) and hot filament chemical vapor deposition (HFCVD) techniques, respectively. The qualities of the deposited films were characterized by scanning electron microscopy(SEM), X ray diffractive spectrometry and Raman scattering spectrometry. The dielectric properties of the diamond film/alumina composites were measured and analyzed as well.

Key words: diamond, thin film, alumina ceramics, dielectric properties

MO YAOWU, XIA YIBEN, XIN JISHENG, HUANG XIAOQIN, WANG HONG. Investigation of the Dielectric Properties and Characterization of Diamond Film/Alumina Composites[J]. Journal of Applied Sciences, 1998, 16(3): 355-359.

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Investigation of the Dielectric Properties and Characterization of Diamond Film/Alumina Composites

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