Journal of Applied Sciences ›› 1999, Vol. 17 ›› Issue (2): 232-236.
• Articles • Previous Articles Next Articles
LI CHENGMING1, XU ZHONG1, TIAN LINHAI1, WANG JIANMING1, SU YONGAN1, XIE XISHAN2, DONG JIANXIN2
Received:
Revised:
Online:
Published:
Abstract: Langmuir probe technique is used for the plasma diagnostics of double glow plasma surface alloying technique. It has been shown that the plasma potential and the electron temperature decrease and the plasma density increase, with the rise of the gas pressure and the source electrode voltage and substrate cathode voltage. Under suitable processes condition, the unequal potential hollow cathode effect is produced between the source electrode and substrate cathode. The plasma density is increased apparently from 1010 to 1012 cm-3.
Key words: langmuir probe, plasma parameter, plasma diagnostics
LI CHENGMING, XU ZHONG, TIAN LINHAI, WANG JIANMING, SU YONGAN, XIE XISHAN, DONG JIANXIN. Study on Plasma Diagnostics of Double -Glow Plasma Surface Alloying Technique[J]. Journal of Applied Sciences, 1999, 17(2): 232-236.
0 / / Recommend
Add to citation manager EndNote|Reference Manager|ProCite|BibTeX|RefWorks
URL: https://www.jas.shu.edu.cn/EN/
https://www.jas.shu.edu.cn/EN/Y1999/V17/I2/232