Journal of Applied Sciences ›› 1993, Vol. 11 ›› Issue (2): 166-170.
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WU DINGXIANG
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Abstract: This paper introduces a method of analysing gas by photochemical reaction of laser to form an α-SiH/α-SiC:H multilayer structure amorphous film, and discusses its optical characteristics measured with XPS and other means.
Key words: X-ray photoelectron spectroacopy, photochemical reaction, laser chemical vapor deposition, multilayer amorphous film
WU DINGXIANG. A METHOD TO FORM a-Si:H/a-SiC:H MULTILAYER AMORPHOUS FILM WITH LASER CVD AND THE RESEARCH OF ITS OPTICAL CHAR ACTERISTICS[J]. Journal of Applied Sciences, 1993, 11(2): 166-170.
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https://www.jas.shu.edu.cn/EN/Y1993/V11/I2/166
