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应用科学学报 ›› 1989, Vol. 7 ›› Issue (1): 47-51.

• 论文 • 上一篇    下一篇

钽舟真空蒸发制备高纯金属、合金和硅化物薄膜及其在大规模集成电路中的应用

张一平, 徐元森   

  1. 中国科学院上海冶金研究所
  • 收稿日期:1987-11-22 修回日期:1988-03-12 出版日期:1989-03-31 发布日期:1989-03-31

TANTALUM BOAT USED AS SOURCE HEATER INVACUUM EVAPORATION OF PURE METALALLOYS AND SILICIDE FOR LSI

ZHANG YIPING, XU YUANSEN   

  1. Shanghai Institute of Metallurgy, Academia Sinica
  • Received:1987-11-22 Revised:1988-03-12 Online:1989-03-31 Published:1989-03-31

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摘要： 本文提出以纯钽舟为电阻加热器真空蒸发高纯度Al、Cr、Si、Ti、Al-Si、TiSi等薄膜的方法,测定了这些薄膜的性质.证明钽舟蒸发薄膜具有投资省、操作简单、控制方便、产品沾污少、纯度高等优点,适合于大规模集成电路的研制.

Abstract: The pure tantalum boat used as a source heater for vacuum evaporation of pure Al, Cr, Si, Ti, Al-Si and TiSi2 films is developed. This resistor heater method is attractive because it is simple and inexpensive, there is no ionization radiation and no mobile ion contamination from the heater, and the composition and properties can be controlled. Now this method is incorporated in our LSI development.