多入射角椭偏法同时测量衬底光学常数和膜参数

应用科学学报 ›› 1989, Vol. 7 ›› Issue (3): 201-206.

多入射角椭偏法同时测量衬底光学常数和膜参数

周庆初, 徐乃欣, 石声泰

中国科学院上海冶金研究所

收稿日期:1988-01-02 修回日期:1988-07-30 出版日期:1989-09-30 发布日期:1989-09-30
基金资助:
国家科学基金资助项目

SIMULTANEOUS DETERMINATION OF SUBSTRATEOPTICAL CONSTANTS AND FILM PARAMETERSBY MULTIPLE ANGLE OF INCIDENCEEL LIPSOMETRY

ZHOU QINGCHU, XU NAIXIN, SHIH SHENGTAI

Shanghai Institute of Metallurgy, Academia Sinica

Received:1988-01-02 Revised:1988-07-30 Online:1989-09-30 Published:1989-09-30

摘要/Abstract

摘要： 本文首先讨论了多入射角椭偏法同时测量衬底光学常数和膜参数时结果的唯一性跟各未知参数间相关性的关系,从而提出了选择合适入射角的一般原则.计算了不同入射角下硅-二氧化硅体系和不锈钢钝化膜体系的椭偏参数△、Ψ对n_s、k_s、n_f、k_f、d和人射角φ₀的一阶导数,考查了各未知参数之间的相关性.最后给出了用随机单纯形法对这两个体系进行拟合计算的实例.

Abstract: The dependence of the uniqueness in simultaneous determination of substrate optical parameters and film parameters by multiple angle of incidence ellipsometry on the correlation among these unknown parameters was discussed. A general guide to the selection of angle of incidence was proposed. The first derivatives of △ and ψ with respect to n_s, k_s, n_f, k_f, d and angle of incidence φ₀ were computed for Si-SiO₂ and stainless steel-passive film systems. The correlation among the unknown parameters was examined. A random simplex method was developed to obtain results for these two systems.

周庆初, 徐乃欣, 石声泰. 多入射角椭偏法同时测量衬底光学常数和膜参数[J]. 应用科学学报, 1989, 7(3): 201-206.

ZHOU QINGCHU, XU NAIXIN, SHIH SHENGTAI. SIMULTANEOUS DETERMINATION OF SUBSTRATEOPTICAL CONSTANTS AND FILM PARAMETERSBY MULTIPLE ANGLE OF INCIDENCEEL LIPSOMETRY[J]. Journal of Applied Sciences, 1989, 7(3): 201-206.