English

应用科学学报 ›› 1989, Vol. 7 ›› Issue (3): 260-262.

• 论文 • 上一篇    下一篇

反应离子束刻蚀闪耀光栅技术

傅新定, 方红丽, 陈国明, 邹世昌   

  1. 中国科学院上海冶金研究所
  • 收稿日期:1986-04-16 修回日期:1987-01-07 出版日期:1989-09-30 发布日期:1989-09-30

TECHNOLOGY OF REACTIVE ION BEAM ETCHING OF BLAZED GRATINGS

FU XINDING, FANG HONGLI, CHEN GUOMING, ZOU SHICHANG   

  1. Shanghai Institute of Metallurgy, Academia Sinica
  • Received:1986-04-16 Revised:1987-01-07 Online:1989-09-30 Published:1989-09-30

PDF

85

被引次数

2

摘要： 反应离子束刻蚀[1,2]是在离子束刻蚀[3]基础上发展起来的具有广泛应用前景的微细加工技术.近年来,已被用来制作全息闪耀光栅.

Abstract: The holographic blazed gratings have been microfabricated on a quartz substrate by using the relief grating mask and the reactive ion beam etching technique which has both the advantages of reactive ion beam etching and ion beam milling.
The diffraction efficiency of the first etched gratings is up to 75% with an area of 45×45mm2 and a space frequency of 1200 lines/mm.