Abstract: Thin films are deposited on the surface of the substrate in room temperature. For film deposition, the intense pulsed electron beams with power densities about 10⁹W/cm² produced by a multi-plate chamber have been used to irradiate the target to create the dense plasma with energetic ions of target elements. The processes of deposition have been described. The physicochemical properties and the structures of the films have been characterized by using AES, ESOA, TEM etc.. For such a film deposition method, a variety of applications is expected.