Al-Ti/W-PtSi-Si系统电性能的研究

应用科学学报 ›› 1991, Vol. 9 ›› Issue (1): 61-68.

Al-Ti/W-PtSi-Si系统电性能的研究

李思渊, 张同军, 王晓岗, 贾笑天

兰州大学

收稿日期:1988-07-31 修回日期:1989-03-08 出版日期:1991-03-31 发布日期:1991-03-31

THE INVESTIGATION OF ELECTRICAL CHARACTERISTICS OF Al-Ti/W-PtSi-Si SYSTEM

LI SIYUAN, ZHANG TONGJUN, WANG XIAOGANG, JIA XIAOTIAN

Lanzhou University

Received:1988-07-31 Revised:1989-03-08 Online:1991-03-31 Published:1991-03-31

摘要/Abstract

摘要： 本文给出了Al-Ti/W-PtSi-Si、Al-Ti/W-Si等多层结构电学性能,特别是欧姆接触与抗电迁移性的研究结果.包括电子能谱分析,扫描电镜观测表面形貌,电迁移激活能的确定以及在场感应晶体管和集成电路中的应用效果等.还讨论了相关的作用机理.

关键词: 表面形貌, 抗电迁移性, 比接触电阻

Abstract: In this paper, the electrical characteristics, especially the ohmic contact and electromigration properties of the Al-Ti/W-PtSi system were studied. The surface components, interface profile and the variation of surface morphology with the annealing treatment conditions of this system were observed by AES and SEM methods. The activation energy of the electromigration process was also presented. Surther, We investigated the application effects of the system Al-Ti/W-PtSi for SIT devices and 10, and got excellent effects. Finally, the action mechanism concerned with these effects were discussed.

Key words: specific contact resistance, surface morphology, anti-electromigration properies

李思渊, 张同军, 王晓岗, 贾笑天. Al-Ti/W-PtSi-Si系统电性能的研究[J]. 应用科学学报, 1991, 9(1): 61-68.

LI SIYUAN, ZHANG TONGJUN, WANG XIAOGANG, JIA XIAOTIAN. THE INVESTIGATION OF ELECTRICAL CHARACTERISTICS OF Al-Ti/W-PtSi-Si SYSTEM[J]. Journal of Applied Sciences, 1991, 9(1): 61-68.