应用科学学报 ›› 1987, Vol. 5 ›› Issue (1): 66-71.
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黎锡强
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LI XIQIANG
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摘要： 本文报道了以射频溅射仪溅射沉积非晶态InP薄膜.并用X光衍射法、反射电子衍射怯、扫描电镜、红外分光光度计及俄歇能谱仪等研究了薄膜结构、貌相、组分及吸收边光谱等.并与富In的InP多晶薄膜作比较.
Abstract: The present paper is a report on the deposition of InP films on different substrates by sputtering. Using SEM, AES, X-ray diffractions, RED and infrared spectrophotometer, we have studied the topography, composition, crystal orientation, absorption edge spectrum etc.
黎锡强. 溅射沉积InP薄膜的研究[J]. 应用科学学报, 1987, 5(1): 66-71.
LI XIQIANG. RF SPUTTERING OF InP FILMS[J]. Journal of Applied Sciences, 1987, 5(1): 66-71.
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