Journal of Applied Sciences ›› 1987, Vol. 5 ›› Issue (1): 66-71.

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RF SPUTTERING OF InP FILMS

LI XIQIANG   

  1. Shanghai Institute of Metallurgy, Academia Sinica
  • Received:1984-05-06 Revised:1984-12-26 Online:1987-03-31 Published:1987-03-31

Abstract: The present paper is a report on the deposition of InP films on different substrates by sputtering. Using SEM, AES, X-ray diffractions, RED and infrared spectrophotometer, we have studied the topography, composition, crystal orientation, absorption edge spectrum etc.