Journal of Applied Sciences ›› 1987, Vol. 5 ›› Issue (1): 66-71.
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LI XIQIANG
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Abstract: The present paper is a report on the deposition of InP films on different substrates by sputtering. Using SEM, AES, X-ray diffractions, RED and infrared spectrophotometer, we have studied the topography, composition, crystal orientation, absorption edge spectrum etc.
LI XIQIANG. RF SPUTTERING OF InP FILMS[J]. Journal of Applied Sciences, 1987, 5(1): 66-71.
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