Journal of Applied Sciences ›› 1989, Vol. 7 ›› Issue (3): 260-262.

• Articles • Previous Articles     Next Articles

TECHNOLOGY OF REACTIVE ION BEAM ETCHING OF BLAZED GRATINGS

FU XINDING, FANG HONGLI, CHEN GUOMING, ZOU SHICHANG   

  1. Shanghai Institute of Metallurgy, Academia Sinica
  • Received:1986-04-16 Revised:1987-01-07 Online:1989-09-30 Published:1989-09-30

Abstract: The holographic blazed gratings have been microfabricated on a quartz substrate by using the relief grating mask and the reactive ion beam etching technique which has both the advantages of reactive ion beam etching and ion beam milling.
The diffraction efficiency of the first etched gratings is up to 75% with an area of 45×45mm2 and a space frequency of 1200 lines/mm.