Journal of Applied Sciences ›› 1993, Vol. 11 ›› Issue (1): 5-10.

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OPTICAL ABSORPTION OF ELECTRON-BEAM EVAPORATED a-Si1-xCox FILMS

GAN RUNJING, ZHANG FANGQING, ZHANG JINYAN, CHEN GUANGHUA   

  1. Lanzhou University
  • Received:1991-04-17 Revised:1991-08-10 Online:1993-03-31 Published:1993-03-31

Abstract: The optical absorption properties of electron-beam-evaporated α-Si1-xCox films have been atudied. The result shows that the changes of the component x in the films affect the optical absorption in the long wave approaching that of the infrared more sensitively than in the short wave; the sensitive region of the optical absorption is in the 0.10 at% < x < 2.00 at% region. In the investigated components, when the component a; increases, the optical band gap of the film narrows from 1.50 eV to 1.28 eV. The experimental result is analysed and discussed with Cody's disorder theory of a-Si film.

Key words: optical absorption, transition element, α-Si film, optical band gap