Journal of Applied Sciences ›› 1995, Vol. 13 ›› Issue (1): 35-38.

• Articles • Previous Articles     Next Articles

AN INVESTIGATION OF PLASMA SPECTRUM IN THE PROCESS OF DIAMOND THIN FILM DEPOSITED BY MPCVD

ZHOU MINGHUA, XI YIBEN, ZHANG XUBAI, WANG HONG   

  1. Shanghai University Jiading Campus
  • Received:1992-12-28 Revised:1993-06-18 Online:1995-03-31 Published:1995-03-31

Abstract: The character of the average energy of the electrons in the plasma ball generated by microwaves is studied by observing the spectrum of the plasma ball under different depositing conditions.The mechanism of deposition is discussed by analyzing the collisions between electrons and hydrocarbon molecules and the change of the hydrocarbon radicals' energy.

Key words: average energy of electrons, diamond film plasma spectrum