Abstract: In this Paper, we studied the surface morphology of Low Pressure Chemical Vapor Deposition (LPCVD) polycrstalline silicon at different deposition temperatures by Atomic Force Microscopy (AFM).We found when the deposition time was the same, the grain size and microroughness increased with the increse of the deposition temperature. In addition, we also studied the morphology of magnetron sputtered aluminium silicon alloy at different sputter temperatures by AFM. We found the irregular-shaped grains tilting in varying degrees and piled up in space at 0℃ and the irregular-shaped grains joining together on a plane at 200℃. Furthermore when the sputter temperature was 400℃, the grain size turned to be square-shaped.

Key words: polycrystalline silicon, aluminium silicon alloy, atomic force microscopy, surface morphology